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The Toshiba 2SK3132 is a silicon N-channel MOS type field effect transistor utilizing π-MOSV technology. It features a low drain-source ON resistance of 0.07 Ω (typ.) and high forward transfer admittance of 33 S (typ.). The device supports a drain-source voltage of 500 V, DC drain current of 50 A, and pulse drain current of 200 A. Gate threshold voltage ranges from 2.4 to 3.4 V. Thermal characteristics include a channel-to-case thermal resistance of 0.5 °C/W and a maximum channel temperature of 150°C.
Verify RoHS compatibility status through official Toshiba sales representatives, as markings indicate specific lot number variations. Confirm environmental compliance details directly with the manufacturer before procurement. Ensure handling precautions are followed due to electrostatic sensitivity. Review the latest Toshiba Semiconductor Reliability Handbook for derating concepts and methods prior to integration.
Select this component for applications requiring high voltage tolerance and significant current handling capabilities. Consider the thermal resistance values when designing heat dissipation strategies. Evaluate the gate threshold voltage range against control circuit requirements. Assess switching times and total gate charge parameters for high-frequency operation suitability.
This device belongs to Toshiba's silicon N-channel MOSFET lineup designed for power electronics. It is manufactured using specialized π-MOSV process technology. The component is housed in a TOSHIBA 2-21F1B package. Commercial production began in September 1998. The part is intended for industrial power conversion and motor control applications.
No officially confirmed substitute part numbers are documented in the provided datasheet.